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THE TWO-PHASE COCURRENT DOWNFLOW OF LIQUID NITROGEN IN A VERTICAL RECTANGULAR CHANNEL Pecherkin N.I., Pavlenko A.N., Chekhovich V.Yu., Zhukov V.E., Serov A.F., Nazarov A.D. Institute of Thermophysics SB RAS, Russia, Novosibirsk Houghton P.A., Sunder S. Air Products and Chemicals, Inc, USA , Allentown, PA |
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Channels
of a noncircular cross-section are used to cool the equipment in power
engineering, microelectronics, nuclear technology, air and spacecrafts,
and in many other applications. They cover a wide range of sizes from
units and tens of micrometers to several millimeters. The smaller the size
of channel, the more peculiarities and differences in regularities of heat
transfer and pressure drop are observed in comparison with the flow in
channels of an ordinary size. This is true both for the flow of
single-phase liquids and the processes of boiling and condensation. Since
a considerable surface tension arises in the points with a small curvature
radius, the flow in rectangular channels may have some peculiarities in
comparison with the flow in round tubes. The
liquid downflow in a rectangular channel with a co-current vapor flow or
without it differs from the upward flow by the fact that at low flow
rates, liquid flows as a film over the walls of the channel. If a distance
between walls of the channel is compatible with a capillary constant, for
the downward flow, liquid moves from the wide side of the channel to its
corners. The
current work deals with a study of the liquid nitrogen downflow in a
vertical rectangular channel of 2.6´7.1
mm2.
The flow was studied with a co-current vapor flow and without it.
Visualization, photo- and video recording of the flow regimes at the walls
and over its cross-section were made as well as the measurements of the
film thickness at the narrow and wide sides of the channel.
The
studies were carried out in an optical cryostat with four observation
windows. The test section walls were made from organic glass. To observe
the process and make pictures of the interface in the cross-section, there
were glass windows in a top of the entrance chamber and in the bottom of
the exit chamber of the test section. To measure the film thickness at the
wide and narrow sides of the channel, two coaxial capascitive probes were
installed. Experiments were carried out at the atmospheric pressure. A
range of Reynolds number for the liquid phase was from 200 to 2000, and
for vapor it was from 0 to 20000. Vapor velocities from 0 to 15 m/s
corresponded to the above Reynolds numbers. Reynolds numbers were
determined by superficial liquid and vapor velocities and equivalent
hydraulic diameter. For
low liquid flow rates without vapor flow at a wide side of the channel,
liquid flows as a film with almost smooth surface, where the waves of
insignificant amplitude and frequency occur. At the narrow sides of the
channel, film thickness is very small. A considerable part of liquid flows
in the corners of the channel. Profiles
of the wavy surface and amplitude-wave spectrums show two separate flows
at the narrow and wide sides of the channel with various wave
characteristics. These flows have their characteristic wavelength and
average thickness of the film. Therefore, local liquid Reynolds numbers,
calculated through the reduced liquid flow rate may be quite different for
the narrow and wide sides of the channel. The
average film thickness at the wide side gradually increases with an
increase of Reynolds number. For high Reynolds numbers, the average film
thickness at the narrow side is 2-3 times higher than that at the wide
side. This increase is caused by the process of liquid accumulation in the
corners of the channel under the action of surface tension. According to
the comparison of the film thickness at the wide side with calculation by
Nusselt formula for a smooth plate, the real film thickness decreases
almost twice in contrast to the calculated value due to the liquid flow to
the narrow side.
The significant vapor effect on the flow structure in the channel begins at the flow rates, corresponding to Reynolds numbers of above 10000. At the narrow side the wave amplitude is high even for the low vapor flow rates. With an increase of the vapor flow rate, separate waves of high amplitude appear at the narrow side. For high vapor velocities waves at the wide and narrow sides interact with each other, roll waves of high amplitude appear, and sometimes they can fill the whole cross-section of the channel. The transverse wave dimension decreases along the wide side and their frequency increases. Waves with higher amplitude promote liquid flow from one side to another and equalize the average film thickness over the perimeter. The film thickness is smoothed out over the perimeter only under the action of the high-speed vapor flow during transition to the dispersed-annular flow. |